Product Introduction

Product Introduction

EUV Mask EUV Pellicle Analysis System

SOL T 5.0

  • Integration of SE, SR and ST
  • Easy and Robust Operation Based on Auto Align and Auto Mapping
  • Thickness, Composition and Optical Property Characterization of ARC(TaON), Abs(TaN), Cap(Ru), MoSi Multilayer and Pellicle
  • Thickness of Ultrathin Metal(Ru, TaXY), Mo Silicides