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PRODUCT

Product Introduction

Product Introduction

EUV Mask Cleaning System

SOL C 5.0

  • Environmental-friendly Dry-Clean Technique for EUV Mask
  • World first 3rd generation Nozzle – MicroJet®
  • IMT patented liquefied CO2 delivery
  • Various angle for efficient cleaning
  • Residue removal after Mask AFM Rework