LASER / CO₂
HBM Wafer Cleaning
HBM(High Bandwidth Memory)Wafer Cleaning System DANDI 3100
- 去除 DRAM 晶圆切割过程中产生的细小颗粒
- 显着提高存储器堆叠过程中的缺陷率
- 简单的干洗流程 & 非常快的吞吐量 > 40 wph
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