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LASER / CO

LASER / CO₂

HBM Wafer Cleaning

HBM(High Bandwidth Memory)Wafer Cleaning System DANDI 3100

  • Removal of fine particles generated during the DRAM wafer cutting process
  • Dramatically improved defect rate in memory stacking process
  • Simple dry cleaning process & very fast throughput > 40 wph
  • < HBM(High Bandwidth Memory)Wafer Cleaning System DANDI 3100 >