EUV Mask EUV Pellicle Analysis System

SOL T 5.0

• Integration of SE, SR and ST
• Easy and Robust Operation Based on Auto Align and Auto Mapping
• Thickness, Composition and Optical Property Characterization of ARC(TaON), Abs(TaN), Cap(Ru), MoSi Multilayer and Pellicle
• Thickness of Ultrathin Metal(Ru, TaXY), Mo Silicides